Fast Dual-Graph-Based Hotspot Filtering
نویسندگان
چکیده
منابع مشابه
Fast Dual Graph Based Hotspot Detection
As advanced technologies in wafer manufacturing push patterning processes toward lower-k1 subwavelength printing, lithography for mass production potentially suffers from decreased patterning fidelity. This results in generation of many hotspots, which are actual device patterns with relatively large CD and image errors with respect to on-wafer targets. Hotspots can be formed under a variety of...
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ژورنال
عنوان ژورنال: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
سال: 2008
ISSN: 0278-0070
DOI: 10.1109/tcad.2008.927765